Tantalum also has excellent chemical properties and high corrosion resistance.

Tantalum TA, a metal element, occurs mainly in tantalite and coexists with niobium.

As we all know, the development trend of target material technology is closely related to the development trend of film technology in downstream application industry.

An orthogonal magnetic field and electric field are added between the sputtering target electrode (cathode) and anode to fill the required inert gas (usually Ar gas) in the high vacuum chamber.

The target material of coating is the sputtering source which forms various functional films on the substrate by magnetron sputtering, multi arc ion plating or other types of coating system under appropriate technological conditions.

Health hazard There is no report of zirconium poisoning in industry.